The paper deals with modern approaches in microstructure device production above possibilities of the e-beam origination. Three-dimensional (3D) holographic structures such as microlenses with variable height, blazed gratings, computer generated holograms are indispensable in advanced optical variable devices (OVD).

Their performance could be significantly reduced by nonideal exposure of photoresist during optical direct laser writing. In this presentation, we demonstrate correction and significant improvement of gray-scale lithography exposure by understanding of Gaussian beam propagation and attenuation in absorbing photoresist. We demonstrate flawless fabrication of advanced holographic security elements, for example, microlenses and Fresnel lenses with variable height, blazed gratings and computer generated holograms with selected diffraction efficiency.