Through innovative process exploration, a new anti-counterfeiting R&D platform has been developed. On this platform, classic anti-counterfeiting technologies— such as watermarking, window features, optical techniques, and laser technologies—are organically integrated with cutting-edge semiconductor industry technologies like photolithography and Digital Light Processing (DLP). This fusion creates anti-counterfeiting elements with novel characteristics. This is not a mere stacking or mixing of technologies but a creative interdisciplinary and cross domain integration that fundamentally enhances the functionality of anti counterfeiting elements, resulting in a unique paper-plastic composite anti counterfeiting technology.

The core of this technology lies in using ultraviolet (UV) light to precisely modify localized areas of paper substrates coated with photocurable materials. This modification alters the texture and transparency of targeted regions, creating a distinct contrast between the modified “plastic-like” zones and the original paper substrate. Thus, a “paper-plastic” composite effect is achieved within a single-layer planar material, establishing a new research direction. This platform not only enables the development of novel anti-counterfeiting elements but also offers extensive potential for technological extension and application.